Sixth International Conference on Hot-Wire Chemical Vapor Deposition (Cat-CVD) Process
September 13-17 2010, Ecole Polytechnique, Paris
This conference is designed to promote synergies between Hot Wire Chemical Vapor Deposition researchers working on different materials (semiconductors, metal oxides, organics etc) and addressing different applications (solar cells, sensors, industrial coatings etc. First submission deadline: April 1, 2010.
HWCVD - also known as catalytic CVD, Hot filament CVD, and more recently Initiated CVD - allows to acheive high quality silicon related materials (amorphous, nanocrystalline , polycrystalline and epitaxial), silicon alloys (nitrides, oxides, carbides) carbon nanotubes, transition metal oxide nano-particles and polymers. Device applications of HWCVD films include thin film transistors, solar cells, light emitting diodes, gas sensors, electrochromic windows, organic devices and micromechanical structures. Contributions using Hot Wire chambers for dry etching, surface passivation or chamber cleaning are also welcome.
Common themes will be process fundamentals (nucleation, coalescence, surface roughening etc), technical improvements (filament lifetime etc), new developments (process, apparatus) and technology transfer (industrial implementation).
First deadline: Abstract submission: April 1, 2010
For more information http://hwcvd6.polytechnique.fr/
The abstract form is available here: http://hwcvd6.polytechnique.fr/doc/hwcvd6_abstract_form.pdf
contact:
HWCVD-6 Secretariat :
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Chairman: Jean-Eric Bourée :
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